New VeritySEM ® 10 system delivers industry-leading resolution and imaging speed to help chipmakers accelerate process development and maximize yield in high-volume manufacturing SANTA CLARA, Calif., ...
SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. (AMAT) today unveiled a breakthrough in patterning technology that allows chipmakers to create high-performance ...
Intel has completed acceptance testing of the industry's first commercial high-NA EUV lithography system with a numerical aperture of 0.55, the ASML Twinscan EXE:5200B, laying the foundation for mass ...
China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They ...
ASML provided Intel, its first customer, with the $380 million Twinscan EXE:5000 High-NA lithography machine. Yesterday, it shipped its second High-NA EUV lithography machine to a mystery customer.
However, there have been hints Intel may insert high-NA earlier into its 18A node, which is ramping up today. There's a ...
Morning Overview on MSN
China reportedly reverse-engineered the world’s top chipmaking tool
China is now accused of doing what Washington spent years trying to prevent: building its own version of the world’s most advanced chipmaking tool and edging closer to independence from foreign ...
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...
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